SMIT 20191024 Perovskites Various solutions Hangzhou 2019

Solutions for Perovskites Rigid (S2S) and Flexible (R2R) applications Company introduction Founded in 1936 in Nijmegen, the Netherlands. Today, our headquarters are in Eindhoven Background in display and glass applications High temperature glass treatment (TTg) Residual stress / deformation Proven track record Thin Film Plasma applications: PE-CVD sALD / PE-sALD deposition roll to roll or rigid substrates. Thermal deposition and treatments like CVD VTD, CSS and semiconductor activation Production solutions both Roll to Roll and Sheet to Sheet OLED final cooling in N2 Can be upgraded later for top side deposition tests o sc i l l at i n g o sc i l l at i n g h i g h sp e e d st o p h i g h sp e e d o sc i l l at i n g o sc i l l at i n g h i g h sp e e d h i g h sp e e d sl o w sp e e d h i g h sp e e d h i g h sp e e d h i g h sp e e d o sc i l l at i n g o sc i l l at i n g o sc i l l at i n g h i g h sp e e d h i g h sp e e dh i g h sp e e d P U M PP U M P P U M P D O O R DO O R H E A T I N G C H A M B E R S C1 C2 C3 C4 C5 C6 C7 C8 UN - L O A D I N G T A B L E D E PO C H A M B E R S L O W C O O L I N G C H A M B E R S D O O R L OA D L OC K L O A D L O C K DOO R L O A D I N G T A B L E F A S T C O O L I N G C H A M B E R S V A C U U M A T M O S P H E R I C N I T R O G E N V A C U U M V A C U U M f F U T U R E T O P S I D E D E P O Equipment: 600 x 1200 mm substrates Vacuum based VTD deposition 3 chambers 3 Evaporators Equipment: 325 x 400 mm / 300 x 300 mm Pilot System CSS VTD CVD Co-evaporation PE-CVD Multi purpose gas supply system Atmosphere control Vacuum control Spatial ALD Spatial ALD R HTL: NiO with PE-sALD Integrated plasma head for PE sALD for water free process or low temperature sALD Roll to Roll in the LAB Grow rates 1 nm/s 300 mm wide web Atmospheric pressure Contact free web transport Materials deposited R&D: Al2O3, TiO2, SiO2, HfO2, In2O3, ZnO, ZnO:Al, ZnO:In, IGZO, ZnSnOx, Zn(O,S), silver, Alucone Materials deposited Roll to Roll: Al2O3, TiO2, Zn(O,S), ZnO, ZnO:Al Courtesy of TNO sALD Production 600 mm wide web Pre and post treatment Inline Metrology 1 – 15 m/minute Ink Jet printing or slot die coating UV or thermal curing Surface activation (corona or plasma treatment) Particle cleaning Interleaf wind - unwind From LAB to FAB 60 precursor slots Each individual slot can be supplied with a different precursor Up to 6 different precursors can be used simultaneously