13-推动中国高效异质结电池产业化崛起：先进臭氧清洗，ICP-PECVD及PVD关键设备-Zhenhao Zhang

SINGULUS TECHNOLOGIES November 2016 12th CSPV, Jiaxing/China 推动中国高效异质结电池产业化崛起： 先进臭氧清洗，ICP-PECVD 及PVD关键设备 Zhenhao Zhang PhD. 张振昊 博士 Technical Director Greater China 大中华区技术总监 SINGULUS TECHNOLOGIES AG 11-2016 - 2 - Outline 1 SINGULUS TECHNOLOGIES AG 2 HJT Solar Cell Process Flow 4 SINGULAR-HET 3 SILEX II CLEANTEX 5 GENERIS PVD SINGULUS TECHNOLOGIES AG 11-2016 - 3 - History SINGULUS TECHNOLOGIES Foundation SINGULUS TECHNOLOGIES Ernst Leybold started his business in Cologne Company building 1860 1966 1851 1860 1967 1995 LEYBOLD HERAEUS Vacuum Technology, Metallurgy and Coating Unicorn Pharmacy was founded 1600 in Hanau W.C. Heraeus took over business in 1851 and started with platinum 1851 Merger LEYBOLD / BALZERS 1995 SINGULUS TECHNOLOGIES AG 11-2016 - 4 - SINGULUS TECHNOLOGIES Headquarters in Kahl/Germany SINGULUS TECHNOLOGIES AG 11-2016 - 5 - SINGULUS TECHNOLOGIES Manufacturing Location in Fürstenfeldbruck/Germany SINGULUS TECHNOLOGIES AG 11-2016 - 6 - Outline 4 SINGULAR-HET 3 SILEX II CLEANTEX 5 GENERIS PVD 1 SINGULUS TECHNOLOGIES AG 2 HJT Solar Cell Process Flow SINGULUS TECHNOLOGIES AG 11-2016 - 7 - HJT Solar Cell Process Flow Texturing /cleaning a-Si Fr./Re. ITO/metal Fr./Re. Printing Fr./Re. Annealing Testing /Sorting SINGULUS TECHNOLOGIES AG 11-2016 - 8 - HJT Solar Cell Process Flow Texturing /cleaning a-Si Fr./Re. ITO/metal Fr./Re. Printing Fr./Re. Annealing Testing /Sorting SILEX II SINGULUS TECHNOLOGIES AG 11-2016 - 9 - HJT Solar Cell Process Flow Texturing /cleaning a-Si Fr./Re. ITO/metal Fr./Re. Printing Fr./Re. Annealing Testing /Sorting SILEX II SINGULAR-HET SINGULUS TECHNOLOGIES AG 11-2016 - 10 - HJT Solar Cell Process Flow Texturing /cleaning a-Si Fr./Re. ITO/metal Fr./Re. Printing Fr./Re. Annealing Testing /Sorting GENERIS PVD SILEX II SINGULAR-HET SINGULUS TECHNOLOGIES AG 11-2016 - 11 - Outline 2 HJT Solar Cell Process Flow 4 SINGULAR-HET 5 GENERIS PVD 3 SILEX II CLEANTEX 1 SINGULUS TECHNOLOGIES AG SINGULUS TECHNOLOGIES AG 11-2016 - 12 - SILEX II CLEANTEX • Batch platform for advanced texturing/cleaning • Batch size 200/400 wafers 156 x156 mm 2 • Throughput up to 6000 wph gross SILEX II CLEANTEX6000 SINGULUS TECHNOLOGIES AG 11-2016 - 13 - Cleaning procedures for HJT Preclean Postclean Structuring Conditioning SINGULUS TECHNOLOGIES AG 11-2016 - 14 - Cleaning procedures for HJT NH 4 OH H 2 O 2 SDR Tex NH 4 OH H 2 O 2 HF HNO 3 HCl H 2 O 2 HF Dry RCA Preclean Postclean Structuring Conditioning SC1 SC1 SC2 SINGULUS TECHNOLOGIES AG 11-2016 - 15 - Cleaning procedures for HJT NH 4 OH H 2 O 2 SDR Tex NH 4 OH H 2 O 2 HF HNO 3 HCl H 2 O 2 HF Dry DIO 3 SDR Tex DIO 3 HF HF Dry RCA O 3 Preclean Postclean Structuring Conditioning SC1 SC1 SC2 SINGULUS TECHNOLOGIES AG 11-2016 - 16 - O 3 vs. RCA: process advantage Moldovan et al. FhG ISE on PVSEC-26 ，Oct. 2016 SINGULUS TECHNOLOGIES AG 11-2016 - 17 - O 3 vs. RCA: process advantage Moldovan et al. FhG ISE on PVSEC-26 ，Oct. 2016 RCA SINGULUS TECHNOLOGIES AG 11-2016 - 18 - O 3 vs. RCA: process advantage Moldovan et al. FhG ISE on PVSEC-26 ，Oct. 2016 RCA O 3 SINGULUS TECHNOLOGIES AG 11-2016 - 19 - O 3 vs. RCA: process advantage Moldovan et al. FhG ISE on PVSEC-26 ，Oct. 2016 Δη=0.17% Δη=0.38% Δη=0.84% RCA O 3 SINGULUS TECHNOLOGIES AG 11-2016 - 20 - O 3 vs. RCA: cost advantage CLEANTEX2800 RCA H2O2 520.638,34 € 35,7% KOH 494.050,86 € 33,9% Additive 161.072,49 € 11,0% HNO3 86.214,85 € 5,9% Power 66.667,10 € 4,6% DI-Water 64.603,60 € 4,4% HF 37.976,44 € 2,6% HCl 21.865,22 € 1,5% CDA 4.761,94 € 0,3% N2 1.150,80 € 0,1% O2 - € 0,0% Total 1.459.001,63 € CLEANTEX2800 O3 H2O2 - € 0,0% KOH 490.098,45 € 60,1% Additive 161.072,49 € 19,7% HNO3 - € 0,0% Power 44.444,74 € 5,4% DI-Water 55.794,02 € 6,8% HF 32.738,31 € 4,0% HCl 21.865,22 € 2,7% CDA 4.761,94 € 0,6% N2 1.150,80 € 0,1% O2 3.809,55 € 0,5% Total 818.735,51 € - € 100.000,00 € 200.000,00 € 300.000,00 € 400.000,00 € 500.000,00 € 600.000,00 € CLEANTEX2800 BL CLEANTEX2800 O3 521.000 € = 386 万RMB 86.000 € = 64 万RMB 36.000 € = 27 万RMB Δ = 64 万€/ 年 = 474 万RMB/ 年 ! RCA SINGULUS TECHNOLOGIES AG 11-2016 - 21 - O 3 vs. RCA: summary • RCA cleaning: o Empirical dosing o Chemical consuming o Not eco-friendly • DI/Ozone (DIO 3 ): o Real time monitoring of ppm o Chemical saving o Disposal saving DIO 3 bath Eutrophication due to N O 3 is the key for cost-efficient mass production of HJT! SINGULUS TECHNOLOGIES AG 11-2016 - 22 - Outline 2 HJT Solar Cell Process Flow 4 SINGULAR-HET 5 GENERIS PVD 1 SINGULUS TECHNOLOGIES AG 3 SILEX II CLEANTEX SINGULUS TECHNOLOGIES AG 11-2016 - 23 - SINGULAR-HET * Inductively Coupled Plasma Enhanced Chemical Vapor Deposition 电感耦合等离子化学气象沉积 • Based on ICP-PECVD* enabling fast but soft deposition • Coating 2 x passivation and 2 x doped layers in 1 x run without vacuum break SINGULUS TECHNOLOGIES AG 11-2016 - 24 - High quality a-SiO x passivation • Addition of minor amount of CO 2 for a-SiO x • Increase of minority carrier life time up to 4 ms • Expansion of process window up to 200 °C • Properties more appropriate for mass production SINGULUS TECHNOLOGIES AG 11-2016 - 25 - Outline 2 HJT Solar Cell Process Flow 5 GENERIS PVD 1 SINGULUS TECHNOLOGIES AG 3 SILEX II CLEANTEX 4 SINGULAR-HET SINGULUS TECHNOLOGIES AG 11-2016 - 26 - GENERIS PVD • High throughput up to 5500 wph • Mono- or bifacial coating • Coating materials: o TCO (ITO, AZO) o Metal/alloys (Ag, Cu, Ni, NiV, Al, etc.) SINGULUS TECHNOLOGIES AG 11-2016 - 27 - GENERIS PVD LAB • Laboratory sputtering tool • 4 x wafers on carrier • Wafer heating • Target l = 550 mm • Sputtering gases: Ar, O 2 , etc. SINGULUS TECHNOLOGIES AG 11-2016 - 28 - O 2 Content on Properties of the ITO Layer • Sheet resistivity R s : o Reduction with temperature o Minimum at O 2 content of 1.2% • Transmission: o Abrupt change with O 2 addition o Optimum at similar O 2 content SINGULUS TECHNOLOGIES AG 11-2016 - 29 - Summary • SILEX II CLEANTEX: o Throughput 6000 wph o O 3 process chemical-saving and eco-friendly • SINGULAR-HET o Fast and soft deposition via ICP-PECVD o Coating of passivation and doped layers without vacuum break • GENERIS PVD o Throughput 5500 wph o High stability based extensive sputtering experience • Key equipments made in Germany for high η HJT cells made in China! SINGULUS TECHNOLOGIES AG 11-2016 - 30 - Contact SINGULUS TECHNOLOGIES AG Hanauer Landstrasse 103 D-63796 Kahl/Main Dr.-Ing. Stefan Rinck, President and CEO Tel: +49-6188-440-109 Stefan.Rinck@singulus.de Markus Ehret, CFO Tel: +49-6188-440-204 Markus.Ehret@singulus.de Maren Schuster, Head of Investor Relations Tel: +49-6188-440-612 Maren.Schuster@singulus.de Bernhard Krause, Communications Worldwide Tel: +49-6181-9828020 Bernhard.Krause@singulus.de Forward-Looking Statements This presentation contains forward-looking statements based on current expectations, assumptions and forecasts of the executive board and on currently available information. Various known and unknown risks, unpredictable developments, changes in the economic and political environment and other presently not yet identifiable effects could result in the fact that the actual future results, financial situation or the outlook for the company differ from the estimates given here. We are not obligated to update the forward-looking statements made in this presentation unless there is a legal obligation.