异质结量产设备 OAK-U-5和 OAK-DU-5(报告人-胡宏逵-上海理想万里晖薄膜设备有限公司)

Confidential Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved 上海理想万里晖薄膜设备有限公司 2018 11 南昌大学 胡宏逵 , 耿茜 Design Concepts And Status of SHJ Tools OAK-U-5 And OAK-DU-5 Ideal Energy (Shanghai) Sunflower Thin Film Equipment Ltd. Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential The Design Concepts of IE OAK-U Series  In-line vs. cluster  Gen 5 vs. Gen 6 or … .  Productivity and drawbacks  Floor space  Wafer-tray management  Alternated way to increase productivity  Automation in clean & anti-oxidation environment  Vacuum in vacuum vs. single chamber  Very small process chambers (~1/8 of single chamber for the same generation), save special gases usage and utility cost, save pump cost  Process chambers could be stacked to increase productivity  Frequency tuning vs. auto tuning  Boron Cross-contamination management Consider these factors, OAK- U series equipment is so designed and customized built for the SHJ integration 2 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential Design Concepts of Oak-U-5 Cassette In Cassette Out HM1 PM1 PM2 HM2 PM3 PM4 3 Gen 5, PM1 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential Benefits of Vacuum in Vacuum (Box-in-Box) Chamber deform Bottom heating Particle formation Larger chamber, more special gases comsumption and facility cost Stringent pump requirement IXH4550 Minimum deform Bottom & top heating Smaller chamber (1/8), less gases consumption Undemanding pump requirement IXH 1820 Stack multiple chambers Non uniform chamber temperature RPS clean, non-complete No particle Uniform chamber temperature RF clean vacuum vacuum vacuum Atm. pressure 4 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential Drawer-Styled-Process Chamber – Core Unit The design strategy is to developed a series of products, from R&D to production tools using the same basic core unit “Process- Chamber” and sharing the basic recipes • The process chamber, act as a drawer, can be inserted into any of these tools. • Processes developed in R&D, easily transferred into production tool • Stacked the multiple process chamber to increase throughput 5 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential Comparison of Gen. 5 & Gen. 6 Gen 5 (with Box-in-Box) Gen 6 Wafers/tray 56, 7x8 100, 10x10 Tray/chamber 2 or more 1 Throughput/chamber 112 or more 100 Occupied floor space small large Utility cost low high Thermal expansion less more Tray deformation small big Wafers pops-out Less often More often Wafer load automation easy difficult Equipment cost Low high 6 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential IE PECVD Products Roadmap R&D PINE-M-R-5 60MW OAK-U-5 120MW OAK-DU-5 Launch in 2019 7 23.73% efficiency Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential OAK-U-5 Production Status 8 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential 理想万里晖异质结 PECVD设备：客户评价  2018年 8月， JET认证电池效率 23.7%，电池平均效率超过 23.5%；  120MW产线在 H客户处产能 已达 3100片 /小时 ；  客户评价：设备性能优异、稳定性良好，已稳定辉光 2万小时 以上；在持续 45天准中试生产中设备表现优异，效率突破 23% (配国产 PVD设备 ) ；  2017年 8月，在理想万里晖的 PECVD上制备出的 HIT电池效率 经德国 Fraunhofer认证达到 22.83%  2017年 8月， H公司一致决定与理想万里晖签订 600MW重复 订单。  至目前共签订 1.8GW订单 9 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential Certified Champion Cell (8/2018) • Bifacial layout, 5BB • PVD sputtered ITO (90:10) • Screen printed electrodes • No DARC 10 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential 11 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential OAK-U-5 Orders and Manufactured Status Delivered 600 MW, in which,120 MW is running pre- production with 22.5 Ave. efficiency and tact-time ~135 sec. 7 Received 1.8 GW orders 22,000 M2 manufacture facility built 600 MW under construction Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential Introduction of OAK-DU-5 13 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential 理想万里晖叠 10层 PECVD在客户产线运行 PINE-AM-C-5 14 对 应 10 层 反 应 腔 10 个 观 察 窗 分 别 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential 理想万里晖叠 10层的 PECVD设备 叠 10 层 反 应 腔 15 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential 理想万里晖成熟的叠多层 PECVD技术  叠 10层 PECVD设备是成熟产品， 2011年已 推向客户产线；  单层、叠 2层 …… 至叠 10层都是成熟技术。  与其他公司 TFT面板行业 PECVD设备不同， 理想万里晖用了近 7年时间，为异质结量身打 造专用 PECVD设备。 16 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential Stacked Process Chambers 17 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential OAK-DU-5 Tact time 135 S Target throughput 3000 wafer/hr (156mm) Target efficiency 23% Up time 90% 18 Copyright © 2009 Ideal Energy Equipment (Shanghai) Ltd, All Rights Reserved Confidential Thank you！ 19